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Derniers dépôts
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Issraa Shahine, Quentin Hatte, Maxime Harnois, Pierre-Yves Tessier. Large Area Freestanding Au Nanoporous Ultrathin Films Transfer Printed on Bendable Substrates and 3D Surfaces for Flexible Electronics. ACS Applied Electronic Materials, 2024, 6 (4), pp.2281-2288. ⟨10.1021/acsaelm.3c01771⟩. ⟨hal-04552765⟩
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Pascal Bargiela, Vincent Fernandez, Christophe Cardinaud, John Walton, Mark Greiner, et al.. Towards a reliable assessment of charging effects during surface analysis: Accurate spectral shapes of ZrO2 and Pd/ZrO2 via X-ray Photoelectron Spectroscopy. Applied Surface Science, 2021, 566, pp.150728. ⟨10.1016/j.apsusc.2021.150728⟩. ⟨hal-03355769⟩
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Allan Lebreton, Marie-Paule Besland, Pierre-Yves Jouan, Tatiana Signe, Cédric Mannequin, et al.. Control of microstructure and composition of reactively sputtered vanadium nitride thin films based on hysteresis curves and application to microsupercapacitors. Journal of Vacuum Science & Technology A, 2024, 42 (2), pp.023405. ⟨10.1116/5.0177028⟩. ⟨hal-04423908⟩
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Michael Rodriguez-Fano, Mohamad Haydoura, Julien Tranchant, Etienne Janod, Benoît Corraze, et al.. Enhancing the Resistive Memory Window through Band Gap Tuning in Solid Solution (Cr1–xVx)2O3. ACS Applied Materials & Interfaces, 2023, 15 (47), pp.54611-54621. ⟨10.1021/acsami.3c09387⟩. ⟨hal-04361024⟩
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J. Zgheib, L. Berthelot, J. Tranchant, N. Ginot, M.-P. Besland, et al.. Electron-enhanced high power impulse magnetron sputtering with a multilevel high power supply: Application to Ar/Cr plasma discharge. Journal of Vacuum Science & Technology A, 2023, 41 (6), pp.063003. ⟨10.1116/6.0002857⟩. ⟨hal-04299303⟩
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T Meyer, A Girard, M Bouška, E Baudet, M Baillieul, et al.. Mass spectrometry and in situ x-ray photoelectron spectroscopy investigations of organometallic species induced by the etching of germanium, antimony and selenium in a methane-based plasma. Plasma Sources Science and Technology, 2023, 32 (8), pp.085003. ⟨10.1088/1361-6595/aceaa5⟩. ⟨hal-04186877⟩
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Anthony Valero, Adrien Mery, Dorian Gaboriau, Marc Dietrich, Maggie Fox, et al.. Redefining high-k dielectric materials vision at nanoscale for energy storage: A new electrochemically active protection barrier. Electrochimica Acta, 2021, 389, pp.138727. ⟨10.1016/j.electacta.2021.138727⟩. ⟨hal-03355843⟩
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Rémi Dussart, Thomas Tillocher, Gaelle Antoun, Jack Nos, Philippe Lefaucheux, et al.. Plasma cryogenic etching processes: what are the mechanisms involved at very low temperature ?. 14th EU-Japan Joint Symposium on Plasma Processing (JSPP) 2023, Satoshi Hamaguchi, Apr 2023, Okinawa, Japan, Japan. ⟨hal-04072312⟩
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Nombre de documents
76
Nombre de notices
277
Mots-clés
A3 Physical vapor deposition processes
Bipolar resistive switching BRS
Carbon Nanotube
Scanning electron microscopy
B1 Inorganic compounds
CH4
Anatase
Aluminium nitride
Vanadium Sesquioxide
Optical properties
Ambipolar material
C Photoelectron spectroscopy
Band alignment
Resistive switching
A Multilayers
Plasma etching
Amyloid precursor
Colloidal solution
Mott insulators
Transfert d'énergie
SF 6
Atomic layer etching
TiO2
Aryl-diazonium salts
Chemical detection
CIGSe
B2 Quaternary
Mott insulator
Ablation laser
Chemical and biological sensors
Bixbyite
Selenization
Kirkendall effect
Low-pressure plasma processing
Functionalization
AZO thin films
B Chemical synthesis
Amorphous
Oxides
Biomasse
Transmission electron microscopy
Chalcogenide
Films
Alzheimer's disease
B3 Solar cells
PECVD
Thin films
Chalcogenides
Applications industrielles
Biocapteurs
Magnetron sputtering
Titanium dioxide
Sol-gel
Carbon
Semiconductors
A-CNx
Band gap
TEM
A1 Characterization
Residual stress
Atomic force microscopy
Carbon nanotubes
Argon InP chlorine etching inductive coupled plasma ICP modeling plasma sheath simulation
Physical vapor deposition
X-ray photoelectron spectroscopy
Biofilms microbiens
Spectroscopic ellipsometry
CaTiO3Pr^3^+
B2 Semiconducting alloys
Etching
3 nm in size
Adsorption
V2O3
Nanocomposite
B2 Semiconducting indium compounds
AlN
AuCu alloy
Calcined clay
CNTs’ collapse
CHLORINE PLASMAS
Carbon nitride
Cathepsin
Non-volatile memory
Copper
NEXAFS
Plasmas froids
Capacitance
Sputtering
Avalanche breakdown
A Thin films
Structure
Nanotubes
Thin film
A Chalcogenides
Buffer Couple
X-ray diffraction
XPS
BOMBARDMENT
Alloying
Chalcogenide glass